植体长轴故意近中偏移

切开，左上7牙根近中面刮治，钻洞，不用tap,但用4.0x10毫米报废植体（2nd line instead of 3rd one, 1.5 mm superficial）和treatment planning abutment，涂Emdogain，之后用正式植体（4.5x11.0或者13 mm，2nd line instead of 3rd one, 1.5 mm superficial），profile drill (mesial crest)，放置treatment planning 基台（4毫米cuff），粘性骨粉到植体平台，正式基台，骨粉，临时牙冠，PRF膜。No Deviation Xin Wei, DDS, PhD, MS 1st edition 11/10/2020, last revision 12/16/2020